The Double Furnaces Rig (1200°C) is a high-temperature thermal processing system engineered for advanced research on optoelectronic materials. Featuring two independently controlled furnaces, this rig enables precise temperature control and flexible experimental setups, making it ideal for comparative studies, staged heat treatments, and complex material-processing workflows.

Capable of operating at up to 1200°C, the double-furnace configuration provides stable, repeatable conditions for research on semiconductors, photonic materials, and other optoelectronic compounds. Its robust design and accurate temperature control make it suitable for university laboratories, research institutions, and R&D environments focused on next-generation optoelectronic technologies.