The 3-Zone Tube Furnace (1300°C) is a precision laboratory furnace designed for semiconductor wafer treatment and high-temperature processing. With a maximum operating temperature of 1300°C, this furnace provides precise thermal control and uniform heating across three independently controlled zones, ensuring optimal process consistency and repeatability.

Featuring a 200 mm-diameter tube and a 600 mm heated length, the furnace accommodates large wafers. It supports uniform temperature distribution, making it ideal for applications such as annealing, oxidation, diffusion, and other semiconductor fabrication processes. Its multi-zone design allows researchers and production engineers to fine-tune temperature profiles for advanced materials processing.

Engineered for reliability, accuracy, and high-performance operation, this 3-zone tube furnace is ideal for semiconductor research laboratories, R&D facilities, and production environments.