Horizontal & Vertical Configuration

The TSU Universal Tube Furnace is a highly adaptable laboratory furnace engineered for maximum flexibility and performance. Designed to operate in both horizontal and vertical orientations, it supports a wide range of scientific and industrial applications, including sample firing, chemical vapour deposition (CVD), quenching tests, crystal growth, and sintering.
Easily position the furnace horizontally or at an angle for growing electronic crystals used in semiconductor manufacturing, or rotate it vertically for advanced sintering applications. The TSU is available in a temperature range of 1200°C to 1600°C, making it suitable for diverse thermal processing needs.

Standard Features

• Elemental tube supplied as standard for use up to 1200°C.

• Universal vertical-mounted tube furnace with an independent control console.

• For temperatures above 1200°C, a separate work tube is required and sold as an essential accessory.

• The pivoting mechanism allows the furnace to be positioned at any angle from horizontal to vertical, supported by a solid stop system.

• Supplied with a special stand for stable use in both horizontal and vertical modes.

• Protective outer mesh covers enhance operator safety.

• For aggressive or contamination-prone processes, a separate work tube is recommended to protect the elemental tube.

• Equipped with a high-end microprocessor PID temperature controller for precision temperature stability.

Optional Accessories

• Additional work tubes are available in various materials, lengths, and diameters for atmosphere containment or protection against contaminants.

• Triple-flange gas-tight end seals for processing under vacuum or controlled gas atmospheres.

• Electrically driven rocking device for applications requiring continuous sample motion, with full safety guarding.

• Multi-segment, multi-program storage controllers for advanced temperature profiling.

• Over-temperature protection controllers for enhanced safety and regulatory compliance.